Method for forming thin film, apparatus for forming thin...

Details Method for forming thin film, apparatus for forming thin... Method for forming thin film, apparatus for forming thin...

2003-09-26

2011-11-22

Meeks, Timothy (Department: 1715)

Coating processes

Direct application of electrical, magnetic, wave, or...

Plasma

Reexamination Certificate

active

08062716

ABSTRACT:
A thin film forming method for plasmatizing a mixture gas, the mixture gas being made up of a monomer gas and an oxidizing reactive gas, and for forming a thin film on a surface of a substrate, the thin film being made of an oxide. The method includes forming a first thin film by plasmatizing the mixture gas while varying a supply flow amount ratio of the monomer gas with respect to the reactive gas and forming a final thin film by increasing the supply flow amount ratio of the monomer gas with respect to the reactive gas after the forming of the first film.

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