Semiconductor device manufacturing: process – Formation of semiconductive active region on any substrate – Fluid growth from liquid combined with preceding diverse...
Reexamination Certificate
2006-11-28
2006-11-28
Fourson, George (Department: 2823)
Semiconductor device manufacturing: process
Formation of semiconductive active region on any substrate
Fluid growth from liquid combined with preceding diverse...
C438S790000, C438S782000, C438S502000, C257SE21479, C257SE21174, C257SE21114
Reexamination Certificate
active
07141492
ABSTRACT:
The invention provides a method of forming a high-performance thin-film at low cost using a liquid material in safety, an apparatus to form a thin-film, a method of manufacturing a semiconductor device, an electro-optical unit, and an electronic apparatus.An apparatus to form a thin-film includes a coating unit to apply a liquid material containing a thin-film component onto a substrate and also includes heat-treating units to heat the substrate applied with the liquid material. The coating unit and the heat-treating units each include a control device to control the atmosphere in a treating chamber to treat the substrate.
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Fourson George
Maldonado Julio J.
Oliff & Berridg,e PLC
Seiko Epson Corporation
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