Coating processes – Direct application of electrical – magnetic – wave – or... – Plasma
Reexamination Certificate
2004-07-08
2010-06-22
Turocy, David (Department: 1792)
Coating processes
Direct application of electrical, magnetic, wave, or...
Plasma
C427S569000, C427S457000, C427S248100
Reexamination Certificate
active
07740917
ABSTRACT:
A method for forming a film comprising a first process and a second process, the first process comprising the steps of: supplying a discharge gas to a first discharge space where high frequency electric field A is generated at or near atmospheric pressure, whereby the discharge gas is excite; transferring energy of the excited discharge gas to a film forming gas, whereby the film forming gas is excited; and exposing a substrate to the film forming gas to form a film on the substrate, and the second process comprising the steps of: supplying a gas containing an oxidizing gas to a second discharge space where high frequency electric field B is generated at or near atmospheric pressure, whereby the gas containing the oxidizing gas is excite; and the film formed in the first process is exposed to the excited gas containing the oxidizing gas.
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Fukuda Kazuhiro
Ii Hiromoto
Kiyomura Takakazu
Mamiya Chikao
Oishi Kiyoshi
Konica Minolta Holdings Inc.
Lucas & Mercanti LLP
Turocy David
LandOfFree
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