Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Making electrical device
Patent
1995-07-12
1997-01-14
Hamilton, Cynthia
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Making electrical device
216 2, 437228, 437229, G03F 722
Patent
active
055938132
ABSTRACT:
A method for forming submicroscopic patterns of a semiconductor device, which comprises: coating a photoresist film on a lower layer to be patterned; primarily exposing the photoresist film through a mask having chrome patterns to a light with an energy lower than the threshold energy for the thickness of the photoresist film; secondarily exposing the photoresist film through the mask to a light with an energy lower than the threshold energy, said mask having been shifted at a predetermined distance; subjecting the exposed photoresist film to development, to completely remove the regions in which the primarily exposed regions overlap with the secondarily exposed regions and half remove the once-exposed regions to form photoresist film patterns, each having four side walls; depositing an insulating layer entirely over the resulting structure; subjecting the insulating layer to anisotropic etch, to form insulating layer spacers at the side walls of the photoresist film patterns; and dry etching the photoresist film patterns and the lower layer with the insulating layer spacers serving as a mask, to form lower layer patterns having a submicroscopic width and a submicroscopic distance therebetween, whereby more submicroscopic patterns than photolithography can allow can be formed.
REFERENCES:
patent: 5023203 (1991-06-01), Choi
patent: 5407785 (1995-04-01), Leroux
Hamilton Cynthia
Hyundai Electronics Industries Co,. Ltd.
Nath Gary M.
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