Method for forming selective emitter of solar cell and...

Semiconductor device manufacturing: process – Introduction of conductivity modifying dopant into... – Diffusing a dopant

Reexamination Certificate

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Details

C438S546000, C438S547000, C438S548000, C438S549000, C257SE21347, C257SE21475, C257SE27123, C257SE27124, C257SE27126

Reexamination Certificate

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08053343

ABSTRACT:
A method for forming a selective emitter of a solar cell and a diffusion apparatus for forming the same are provided. The method includes texturing a surface of a silicon substrate by etching the silicon substrate, coating an impurity solution on the surface of the silicon substrate, injecting a first thermal energy into the whole surface of the silicon substrate, and, while the first thermal energy is injected into the whole surface of the silicon substrate, injecting a second thermal energy by irradiating a laser beam into a partial region of the surface of the silicon substrate.

REFERENCES:
patent: 6825104 (2004-11-01), Horzel et al.

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