Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Radiation sensitive composition or product or process of making
Reexamination Certificate
2010-04-08
2011-11-15
Walke, Amanda C. (Department: 1722)
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Radiation sensitive composition or product or process of making
C430S319000, C430S322000, C430S394000, C430S913000
Reexamination Certificate
active
08057986
ABSTRACT:
The resist material contains a photo-acid generator having an absorption peak to exposure light having a wavelength of less than 300 nm, and a second photo-acid generator having an absorption peak to exposure light having a wavelength of 300 nm or more. The method for forming a resist pattern comprises a step for selectively exposing which exposes a coating film of the resist material to an exposure light having a wavelength of less than 300 nm, and a step for selectively exposing by using an exposure light having a wavelength of 300 nm or more. The semiconductor device comprises a pattern formed by the resist pattern. The method for forming a semiconductor device comprises a step for forming a resist pattern on an underlying layer by the aforementioned manufacturing method, and a step for patterning the underlying layer by etching using the resist pattern as a mask.
REFERENCES:
patent: 4491628 (1985-01-01), Ito et al.
patent: 5403695 (1995-04-01), Hayase et al.
patent: 5679497 (1997-10-01), Kimura
patent: 5981140 (1999-11-01), Sato et al.
patent: 5994022 (1999-11-01), Tanabe et al.
patent: 6027856 (2000-02-01), Nozaki et al.
patent: 6096478 (2000-08-01), Yamana
patent: 6200728 (2001-03-01), Cameron et al.
patent: 6261743 (2001-07-01), Pavelchek et al.
patent: 6280911 (2001-08-01), Trefonas, III
patent: 6391520 (2002-05-01), Nakano et al.
patent: 6440632 (2002-08-01), Yasuda
patent: 6605417 (2003-08-01), Nitta et al.
patent: 6692888 (2004-02-01), Barclay et al.
patent: 6749989 (2004-06-01), Hada et al.
patent: 2003/0098464 (2003-05-01), Kon et al.
patent: 2005/0202352 (2005-09-01), Cyganski et al.
patent: 0594452 (1994-04-01), None
patent: 1500977 (2005-01-01), None
patent: 5-197151 (1993-08-01), None
patent: 7-098499 (1995-04-01), None
patent: 7-130651 (1995-05-01), None
patent: 7-219216 (1995-08-01), None
patent: 8-262743 (1996-10-01), None
patent: 10-073927 (1998-03-01), None
patent: 10-97060 (1998-04-01), None
patent: 11-297597 (1999-10-01), None
patent: 2000-347414 (2000-12-01), None
patent: 2001-228616 (2001-08-01), None
patent: 2002-6491 (2002-01-01), None
patent: 2002-49161 (2002-02-01), None
patent: 3901997 (2007-04-01), None
Japanese Office Action dated Sep. 12, 2006 of JP 2001-361506.
Taiwanese Office Action dated Jun. 23, 2008 of TW 91106378.
European Office Action dated Mar. 24, 2003 of EP 2007431.
Taiwanese Office Action dated Sep. 1, 2004 of TW-91106378.
Kon Junichi
Yano Ei
Fujitsu Limited
Walke Amanda C.
Westerman Hattori Daniels & Adrian LLP
LandOfFree
Method for forming resist pattern and method for... does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Method for forming resist pattern and method for..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method for forming resist pattern and method for... will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-4301846