Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Radiation sensitive composition or product or process of making
Patent
1983-09-26
1984-07-24
Kittle, John E.
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Radiation sensitive composition or product or process of making
430271, 430317, 430327, 430523, 430531, 430961, G03C 1495, G03C 176
Patent
active
044618255
ABSTRACT:
An improved method of forming a photoresist pattern in the photoengraving process. In the photoengraving process, after forming a photoresist layer, a non-photosensitive organic layer containing cyclized polyisoprene rubber as the major constituent is formed thereover. The organic layer is covered with a mask. The photoresist layer is selectively exposed to light through the organic layer. After developing and removing the organic layer, or together with the organic layer, the photoresist layer is developed.
REFERENCES:
patent: 3458311 (1969-07-01), Alles
patent: 3652273 (1972-03-01), Htoo
patent: 4335173 (1982-06-01), Caraballo
Abe Toshihiro
Kato Tiharu
Koguchi Shigeo
Nakamura Hatsuo
Yonezawa Toshio
Dees Jos,e G.
Kittle John E.
Tokyo Shibaura Denki Kabushiki Kaisha
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