Method for forming patterns using single mask

Details Method for forming patterns using single mask Method for forming patterns using single mask

2011-08-09

2011-08-09

Chacko-Davis, Daborah (Department: 1722)

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Making electrical device

C430S005000, C430S030000, C430S324000

Reexamination Certificate

active

07993814

ABSTRACT:
A method for forming patterns using a single mask includes: disposing a photo mask having a defined pattern, and performing an exposure process by controlling the focal length of an exposure apparatus to a focusing position to form a pattern having the same shape as the photo mask on the wafer; and using the same photo mask, and performing the exposure process by controlling the focal length of the exposure apparatus to a defocusing position to form a reverse pattern having a reversed image with respect to the pattern on the wafer.

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