Semiconductor device manufacturing: process – Chemical etching – Combined with coating step
Reexamination Certificate
2003-12-16
2008-09-16
Chen, Kin-Chan (Department: 1792)
Semiconductor device manufacturing: process
Chemical etching
Combined with coating step
C438S706000
Reexamination Certificate
active
07425509
ABSTRACT:
A method for forming patterns which are aligned on either side of a thin film deposited on a substrate. The method includes depositing a first pattern layer on the thin film which may occur before or after the local etching of the thin film to form a first marking. The method includes etching the first pattern layer in order to form a first pattern and depositing a first bonding layer for covering the first marking and the first pattern. The method may include suppressing the substrate as well as etching the first bonding layer to form a second marking at the location of the first marking. The method includes depositing a second pattern layer, and etching the second pattern layer to form the second pattern.
REFERENCES:
patent: 5013681 (1991-05-01), Godbey et al.
patent: 5436173 (1995-07-01), Houston
patent: 5893744 (1999-04-01), Wang
patent: 5952694 (1999-09-01), Miyawaki et al.
patent: 6184104 (2001-02-01), Tan et al.
patent: 6261918 (2001-07-01), So
patent: 7220655 (2007-05-01), Hause et al.
patent: 2002/0028528 (2002-03-01), Ohtaka
patent: 2002/0076853 (2002-06-01), Kramer et al.
patent: 2005/0009298 (2005-01-01), Suzuki et al.
patent: 5267663 (1993-10-01), None
International Search Report, PCT/FR 03/50179, Sep. 3, 2004 (4 pages).
Deleonibus Simon
Fanget Gilles
Previtali Bernard
Vinet Maud
Chen Kin-Chan
Commissariat a l''Energie Atomique
Thelen Reid Brown Raysman & Steiner LLP
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