Semiconductor device manufacturing: process – Coating with electrically or thermally conductive material – To form ohmic contact to semiconductive material
Reexamination Certificate
2005-03-16
2009-11-10
Pham, Thanhha (Department: 2894)
Semiconductor device manufacturing: process
Coating with electrically or thermally conductive material
To form ohmic contact to semiconductive material
C438S149000, C438S669000, C438S677000, C257SE21575
Reexamination Certificate
active
07615488
ABSTRACT:
A method for forming a pattern according to the invention comprises the steps of: forming a mask over a substrate having light-transmitting properties; forming a first region having a substance including a light-absorbing material over the substrate and the mask; forming a second region by irradiating the substance with light having a wavelength which is absorbable by the light-absorbing material through the substrate to modify a part of the substance surface; and forming a pattern by discharging a compound including a pattern forming material to the second region.
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Written Opinion of the International Searching Authority for PCT/JP2005/005298 dated Jun. 28, 2005.
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Fujii Gen
Maekawa Shinji
Yamamoto Hiroko
Costellia Jeffrey L.
Nixon & Peabody LLP
Pham Thanhha
Semiconductor Energy Laboratory Co,. Ltd.
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