Method for forming pattern of one-dimensional nanostructure

Details Method for forming pattern of one-dimensional nanostructure Method for forming pattern of one-dimensional nanostructure

2006-06-27

2006-06-27

Barreca, Nicole (Department: 1756)

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Making electrical device

C977S726000

Reexamination Certificate

active

07067237

ABSTRACT:
Disclosed herein are a method for forming a pattern of a one-dimensional nanostructure, and a pattern of a one-dimensional nanostructure formed by the method. The method comprises the steps of (i) coating a photocatalytic compound onto a substrate to form a photocatalytic film, and selectively exposing the photocatalytic film to light to form latent image centers for crystal growth, (ii) growing metal crystals by plating the latent pattern to form a metal pattern, and (iii) selectively growing a one-dimensional nanostructure on the metal pattern acting as a catalyst.

REFERENCES:
patent: 6277318 (2001-08-01), Bower et al.
patent: 6420092 (2002-07-01), Yang et al.
patent: 6664727 (2003-12-01), Nakamoto
patent: 6811957 (2004-11-01), Mau et al.
patent: 6897603 (2005-05-01), Mao et al.
patent: 6914381 (2005-07-01), Okai et al.
patent: 2002/0183542 (2002-12-01), Riondel et al.
patent: 2005/0003242 (2005-01-01), No et al.
patent: WO 01/21863 (2001-03-01), None

Affiliated with

Also associated with

Rating

Method for forming pattern of one-dimensional nanostructure does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Method for forming pattern of one-dimensional nanostructure, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method for forming pattern of one-dimensional nanostructure will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-3648120