Method for forming organic layer pattern, organic layer...

Details Method for forming organic layer pattern, organic layer... Method for forming organic layer pattern, organic layer...

2007-03-09

2010-12-07

Coleman, W. David (Department: 2813)

Semiconductor device manufacturing: process

Having organic semiconductive component

C528S310000

Reexamination Certificate

active

07846765

ABSTRACT:
Disclosed are a method for forming an organic layer pattern which is characterized by forming a thin layer by coating a coating solution including a polyimide-based polymer having a heteroaromatic pendant group including a heteroatom in its polyimide major chain, a photoinitiator and a crosslinking agent on a substrate and drying the substrate, and exposing and developing the thin layer, an organic layer pattern prepared by the method, and an organic memory device comprising the pattern. According to example embodiments, a high-resolution micropattern may be formed without undergoing any expensive process, e.g., photoresist, leading to simplification of the preparation process and cost reduction.

REFERENCES:
patent: 5286841 (1994-02-01), Auman et al.
patent: 6908957 (2005-06-01), Musa et al.
patent: 2004/0225026 (2004-11-01), Mizori et al.
patent: 2005/0153238 (2005-07-01), Honda et al.

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