Method for forming nanostructured carbons, nanostructured...

Details Method for forming nanostructured carbons, nanostructured... Method for forming nanostructured carbons, nanostructured...

2004-11-09

2009-02-03

Meeks, Timothy H (Department: 1792)

Coating processes

Direct application of electrical, magnetic, wave, or...

Plasma

C423S447100

Reexamination Certificate

active

07485348

ABSTRACT:
A method for forming nanostructured carbons comprising the steps of: generating a plasma by supplying at least a discharge gas between opposing electrodes and applying a high-frequency voltage between the electrodes under an approximately atmospheric pressure; existing a material gas for forming the nanostructured carbons with the plasma to generate an activated material gas; and exposing a substrate to the activated material gas.

REFERENCES:
patent: 6221330 (2001-04-01), Moy et al.
patent: 2003/0113479 (2003-06-01), Fukuda et al.
patent: 2002-220214 (2002-08-01), None
Nozaki et al, Carbon nanotubes deposition in glow barrier discharge enhanced catalytic CVD, J. Phys. D:Appl. Phys. 35 (2002), p. 2779-2784.
Meyyappan et al, Carbon nanotube growth by PECVD: a review, Plasma Sources Sci. Technol. Apr. 12, 2003, p. 205-216.
Murakami et al, Direct synthesis of high-quality single-walled carbon nanotubes on silicon and quartz substrates, Chemical Physics Letters 377, Jul. 2003, p. 49-54.

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