Semiconductor device manufacturing: process – Coating with electrically or thermally conductive material – To form ohmic contact to semiconductive material
Reexamination Certificate
2008-09-09
2008-09-09
Le, Thao X. (Department: 2892)
Semiconductor device manufacturing: process
Coating with electrically or thermally conductive material
To form ohmic contact to semiconductive material
C257SE21508
Reexamination Certificate
active
11341302
ABSTRACT:
A method for forming multi-layer bumps on a substrate includes depositing an adhesive or a flux on the substrate, depositing a first metal powder on the adhesive, and melting or reflowing the adhesive and first metal powder to form first bumps. An adhesive or a flux and a second metal powder are then deposited on the first bumps, and melted to form second bumps on the first bumps to form multi-layer bumps. The multi-layer bumps are formed without the need for any wet chemicals.
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patent: 2002/0064930 (2002-05-01), Ishikawa
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patent: 07153764 (1995-06-01), None
patent: 2002 076043 (2002-03-01), None
Chau On Lok
Lai Gor Amie
Shiu Hei Ming
Bergere Charles
Freescale Semiconductor Inc.
Le Thao X.
Ullah Elias
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