Method for forming micropattern

Details Method for forming micropattern Method for forming micropattern

1983-04-06

1984-01-17

Powell, William A.

Adhesive bonding and miscellaneous chemical manufacture

Delaminating processes adapted for specified product

Delaminating in preparation for post processing recycling step

156646, 156652, 156655, 1566591, 156904, 204192E, 252 791, 427 431, 430313, 430317, B44C 122, C03C 1500, C03C 2506, B29C 1708

Patent

active

044262477

ABSTRACT:
A method for forming a micropattern, comprises the steps of forming an organic polymeric material layer on a substrate, forming a silicone layer on the organic polymeric material layer, selectively irradiating a surface of the silicone layer with a high-energy beam, exposing the surface of the silicone layer to a radical addition polymerizable monomer gas so as to form a graft polymer film on an irradiated portion of the surface of the silicone layer, performing reactive ion etching using the graft polymer film as a mask so as to form a silicone pattern, and performing reactive ion etching using the silicone pattern as a mask so as to form an organic polymeric material pattern. The method allows formation of a resist pattern with a high precision and a high aspect ratio.

REFERENCES:
patent: 4195108 (1980-03-01), Gazard et al.
patent: 4370405 (1983-01-01), O'Toole et al.

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