Method for forming micro patterns of semiconductor devices

Details Method for forming micro patterns of semiconductor devices Method for forming micro patterns of semiconductor devices

1996-09-27

1998-10-13

Duda, Kathleen

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Making electrical device

430394, 2504922, G03F 720

Patent

active

058210342

ABSTRACT:
A method for forming micro patterns of a semiconductor device which uses a dipole illumination aperture adapted to transmit the spatial frequency components of light only in the X-axis direction and a dipole illumination aperture adapted to transmit the spatial frequency components of light only in the Y-axis direction, thereby obtaining the same effect as in the case using two sheets of masks to provide an increase in process margin.

REFERENCES:
patent: 4859548 (1989-08-01), Heise

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