Method for forming metallic tungsten film

Details Method for forming metallic tungsten film Method for forming metallic tungsten film

2005-11-15

2005-11-15

Chen, Bret (Department: 1762)

Coating processes

Coating by vapor, gas, or smoke

Metal coating

Reexamination Certificate

active

06964790

ABSTRACT:
A deposition method for supplying process gases into an evacuated processing vessel to deposit a metal tungsten film on the surface of an object to be processed. The processing gases include tungsten hexafluoride gas, hydrogen gas, and a reducing gas which has a richer reducing property than that of the hydrogen gas, the amount of the reducing gas being smaller than that of the hydrogen gas. Thus, it is possible to form a metal tungsten film without increasing stress in the film so much even in a low temperature region of about 400° C. and without decreasing a deposition rate so much.

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