Method for forming metal pattern by using metal nanocrystals

Details Method for forming metal pattern by using metal nanocrystals Method for forming metal pattern by using metal nanocrystals

2007-04-17

2007-04-17

McPherson, John A. (Department: 1756)

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Making electrical device

C430S315000, C430S319000, C430S321000, C430S324000, C427S096300, C427S123000, C427S304000, C427S404000, C427S553000, C428S457000

Reexamination Certificate

active

11117431

ABSTRACT:
Disclosed herein is a method for forming a metal pattern by using metal nanocrystals. The method comprises the steps of: (i) coating a photosensitive compound having a substituent, which is converted into a free carboxyl group by light exposure, on a substrate to form a photosensitive film; (ii) selectively exposing the photosensitive film to light in the presence of a photoacid generator to form a latent pattern for crystal growth having a free carboxyl group; and (iii) treating the latent pattern for crystal growth with a nanometallic solution in which metal nanocrystals can be formed to grow the metal nanocrystals on the latent pattern. According to the method, a metal wiring pattern can be formed in a cost-effective and relatively simple manner. Further, the metal pattern formed by the method can be useful in the manufacture of an electromagnetic interference filter for flat panel display devices or an electrode, and can thus be applied to devices, e.g., organic light-emitting devices (OLED) and organic thin-film transistors (OTFT).

REFERENCES:
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patent: 2003/0143411 (2003-07-01), Nakagawa
patent: 2005/0064108 (2005-03-01), Kano et al.
patent: 5-16281 (1993-01-01), None
patent: 11-119675 (1999-04-01), None
patent: 2003-109435 (2003-04-01), None

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