Method for forming magnetic poles in thin film magnetic heads

Details Method for forming magnetic poles in thin film magnetic heads Method for forming magnetic poles in thin film magnetic heads

1997-09-30

1999-08-03

Chu, John S.

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Making named article

430190, 430192, 430325, 2960307, G03C 500

Patent

active

059323965

ABSTRACT:
A resist composition is used to form a plating frame including a space having a section of up to 2 .mu.m in width and at least 4 .mu.m in depth. The resist composition contains as an alkali-soluble resin and a sensitizer a novolak resin obtained by substituting a hydrogen atom in a hydroxyl group in a novolak resin comprising at least one recurring unit represented by the following formula (1): ##STR1## wherein n is an integer of 1 to 4 and m is an integer of 0 to 3, and having a weight average molecular weight of 2,000 to 6,000 calculated as polystyrene by 0.12 to 0.22 moles per hydrogen atom of a 1,2-naphthoquinonediazidosulfonyl group.

REFERENCES:
patent: 3853715 (1974-12-01), Romankiw
patent: 4614563 (1986-09-01), Kubo
patent: 5068959 (1991-12-01), Sidman
patent: 5422221 (1995-06-01), Okazaki et al.
patent: 5725997 (1998-03-01), Kamijima

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