Method for forming insulating film

Details Method for forming insulating film Method for forming insulating film

1994-10-31

1996-07-02

Utech, Benjamin

Fishing, trapping, and vermin destroying

4271262, 427255, 4272553, 427314, 4274192, H01L 2102

Patent

active

055321933

ABSTRACT:
The invention relates to a method for forming a BSG film by means of chemical vapor deposition, has an object which is to provide a film forming method making it possible to obtain a BSG film of high denseness and of low hygroscopicity even immediately after the film has been formed at a low temperature, and comprises a process of forming a borosilicate glass film (BSG film) on a substrate using a mixed gas of an organometallic compound having Si--O--B bond and ozone (O.sub.3).

REFERENCES:
patent: 3837935 (1974-09-01), Maeda et al.
patent: 4892753 (1990-01-01), Wong et al.
patent: 5104482 (1992-04-01), Mankowski et al.
patent: 5281295 (1994-01-01), Maeda et al.
patent: 5324539 (1994-06-01), Maeda et al.
patent: 5376591 (1994-12-01), Maeda et al.

Affiliated with

Also associated with

Rating

Method for forming insulating film does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Method for forming insulating film, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method for forming insulating film will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-1506300