Method for forming IMD films

Details Method for forming IMD films Method for forming IMD films

2007-08-07

2007-08-07

Smoot, Stephen W. (Department: 2813)

Semiconductor device manufacturing: process

Coating of substrate containing semiconductor region or of...

Insulative material deposited upon semiconductive substrate

C438S784000, C438S786000, C427S249150

Reexamination Certificate

active

10937215

ABSTRACT:
A method for forming IMD films. A substrate is provided. A plurality of dielectric films are formed on the substrate, wherein each of the dielectric layers are deposited in-situ in one chamber with only one thermal cycle.

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patent: 2002/0054962 (2002-05-01), Huang
patent: 2004/0150110 (2004-08-01), Usami et al.

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