Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Radiation sensitive composition or product or process of making
Reexamination Certificate
2002-10-04
2009-12-29
Walke, Amanda C. (Department: 1795)
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Radiation sensitive composition or product or process of making
C430S331000, C430S913000, C430S311000
Reexamination Certificate
active
07638255
ABSTRACT:
The invention relates to a reaction development patterning process wherein a photo resist layer masked by a desired pattern is irradiated using ultraviolet light and this layer is subsequently washed using a solvent solution containing alkali characterized by said photo resist layer comprising a condensation type polymer containing in the main chain carbonyl groups (C═O) bonded to hetero atoms and a photo acid generating agent and said alkali being an amine. This reaction development patterning process is characterized by being able to use as a photo resist target resins containing bonds having low reactivity toward nucleophilic reagents, for example, condensation type polymers containing any one of bonds such as carbonate, ester, urethane and amide.
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English lagnuage translation of JP 06-340802.
English language translation of JP 11-202488.
Masao Tomoi et al , Lithographic Properties of Positive Type Photosensitive Block Copolymer Polyimide, Nov. 29, 2000.
Fukushima Takafumi
Itatani Hiroshi
Tomoi Masao
Cohn PLLC Gary C
Walke Amanda C.
Yokohama TLO Company Ltd.
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