Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Post imaging radiant energy exposure
Patent
1996-06-24
1998-12-01
Duda, Kathleen
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Post imaging radiant energy exposure
430313, 430325, 134 33, 134902, G03F 740
Patent
active
058436278
ABSTRACT:
There is provided a method for forming fine patterns in a semiconductor device without the falling down of the patterns, comprising the steps of: coating a photosensitive film on a wafer; patterning the photosensitive film by use of a light mask, followed by development, to form photosensitive film patterns; scattering a first washing solution on the wafer with spinning, to lie the first washing solution on the wafer including the photosensitive film patterns; scattering a second washing solution on the wafer to lie it thereon while spinning the wafer to remove the first washing solution out of the wafer; and spinning the wafer to dry the second washing solution.
REFERENCES:
patent: 4902608 (1990-02-01), Lamb
patent: 5252430 (1993-10-01), Hashimoto et al.
patent: 5340702 (1994-08-01), Hirasawa et al.
patent: 5476753 (1995-12-01), Hashimoto et al.
patent: 5660642 (1997-08-01), Britten
patent: 5667922 (1997-09-01), Martiska
Duda Kathleen
Hyundai Electronics Industries Co,. Ltd.
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