Adhesive bonding and miscellaneous chemical manufacture – Delaminating processes adapted for specified product – Delaminating in preparation for post processing recycling step
Patent
1984-12-10
1987-05-19
Czaja, Donald E.
Adhesive bonding and miscellaneous chemical manufacture
Delaminating processes adapted for specified product
Delaminating in preparation for post processing recycling step
29571, 29580, 148 15, 148187, 148188, 156657, 156662, 20419237, 427 85, 427 87, H01L 21225, H01L 21302
Patent
active
046665579
ABSTRACT:
A method for forming channel stops in the sidewalls of a trench isolation structure formed in a semiconductor substrate. In one form, anistrophically etched substrate trenches are conformally covered by doped glass, the doped glass is anisotropically etched to retain vertical, sidewall segments of doped glass, and the substrate is annealed to form shallow diffusions in the trench sidewalls. The depth of the sidewall diffusion is related to differences in the dopant segregation coefficients between the glass and substrate materials.
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Whittle et al., "Control of Boron Diffusion from a Pyrolitic Borosilicate Glass Source", Journal Electrochemical Society, vol. 116, No. 5, May 1969, pp. 645-648.
Collins George J.
Metz, Jr. Werner A.
Czaja Donald E.
Hawk Jr. Wilbert
Hoch Ramon R.
NCR Corporation
Salys Casimer K.
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