Semiconductor device manufacturing: process – Introduction of conductivity modifying dopant into... – Diffusing a dopant
Reexamination Certificate
2011-07-05
2011-07-05
Bryant, Kiesha R (Department: 2891)
Semiconductor device manufacturing: process
Introduction of conductivity modifying dopant into...
Diffusing a dopant
C257S324000, C257SE21657, C438S288000, C438S519000, C438S545000, C438S555000
Reexamination Certificate
active
07972948
ABSTRACT:
A memory device includes a number of memory cells and a number of bit lines. Each of the bit lines includes a first region having a first width and a first depth and a second region having a second width and a second depth, where the first width is less than the second width. The first region may include an n-type impurity and the second region may include a p-type impurity.
REFERENCES:
patent: 5635415 (1997-06-01), Hong
patent: 6248635 (2001-06-01), Foote et al.
patent: 6723649 (2004-04-01), Chang et al.
patent: 6958272 (2005-10-01), Lingunis et al.
patent: 6987048 (2006-01-01), Cheng et al.
patent: 7176113 (2007-02-01), Wong et al.
patent: 7408222 (2008-08-01), Hagenbeck et al.
patent: 7811915 (2010-10-01), Qian et al.
patent: 2002/0151138 (2002-10-01), Liu
patent: 2003/0067032 (2003-04-01), Caprara et al.
patent: 2003/0104670 (2003-06-01), Wu
patent: 2004/0108540 (2004-06-01), Yoshino
patent: 2004/0110344 (2004-06-01), Huang et al.
patent: 2006/0014348 (2006-01-01), Wu
Co-pending U.S. Appl. No. 12/048,549, filed Mar. 14, 2008 entitled “Method For Forming Bit Lines For Semiconductor Devices” by Weidong Qian et al., 30 pages.
Kamal Tazrien
Qian Weidong
Ramsbey Mark T.
Bryant Kiesha R
Harrity & Harrity LLP
Spansion LLC
Tornow Mark W
LandOfFree
Method for forming bit lines for semiconductor devices does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Method for forming bit lines for semiconductor devices, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method for forming bit lines for semiconductor devices will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-2667740