Method for forming an optical interfering pattern on a...

Semiconductor device manufacturing: process – Making device or circuit emissive of nonelectrical signal – Including integrally formed optical element

Reexamination Certificate

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Reexamination Certificate

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10869255

ABSTRACT:
An article having an optical interfering effect includes a metal substrate with a surface, and a pattern of micro-cavities formed on the surface of the metal substrate and exhibiting an optical interfering effect on the reflection of the pattern of the micro-cavities. Each of the micro-cavities is indented inwardly from the surface of the metal substrate, and has a concave cross-section. A method for forming the pattern of the micro-cavities on the surface of the metal substrate is also disclosed.

REFERENCES:
patent: 6218090 (2001-04-01), Minter et al.
patent: 6363605 (2002-04-01), Shih et al.
patent: 6605519 (2003-08-01), Lishan

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