Method for forming a tunable piezoelectric microresonator

Details Method for forming a tunable piezoelectric microresonator Method for forming a tunable piezoelectric microresonator

2007-02-20

2007-02-20

Olsen, Allan (Department: 1763)

Etching a substrate: processes

Etching of semiconductor material to produce an article...

C310S320000, C029S025350, C204S192180

Reexamination Certificate

active

10794527

ABSTRACT:
A process for manufacturing a resonator including the steps of: forming on an insulating substrate a first portion of a conductive material and a second portion of another material on the first portion; forming an insulating layer having its upper surface flush with the upper part of the second portion; forming by a succession of depositions and etchings a beam of a conductive material above the second portion, the beam ends being on the insulating layer on either side of the second portion, the upper surface of the second portion being exposed on either side of the beam, a third portion of a piezoelectric material on the beam and a fourth portion of a conductive material on the third portion above the beam portion located above the second portion; and removing the second portion.

REFERENCES:
patent: 5587620 (1996-12-01), Ruby et al.
patent: 5714917 (1998-02-01), Ella
patent: 5884378 (1999-03-01), Dydyk
patent: 6204737 (2001-03-01), Ella
patent: 6242843 (2001-06-01), Pohjonen et al.
patent: 6507983 (2003-01-01), Ruby et al.
patent: 2005/0162040 (2005-07-01), Robert
French Search Report from French Patent Application No. 03/02817, filed Mar. 6, 2003.

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