Coating processes – Direct application of electrical – magnetic – wave – or... – Plasma
Patent
1994-09-29
1995-06-27
Pianalto, Bernard
Coating processes
Direct application of electrical, magnetic, wave, or...
Plasma
427249, 427577, B05D 306
Patent
active
054278260
ABSTRACT:
Proposed is an improvement in the process for forming a superhard carbonaceous coating film on various articles by the plasma-induced CVD method using an apparatus in which microwaves generated in an oscillator are introduced into the CVD chamber through a waveguide duct partitioned from the CVD chamber by a gas shield. In the apparatus used according to the invention, a microwave-barrier diaphragm having an orifice of a limited open area is provided between the gas shield in the waveguide duct and the CVD chamber to form a plasma-generating zone between the gas shield and the microwave-barrier diaphragm so that the intensity of the microwaves directly entering the CVD chamber is so limited that the carbonaceous coating film deposited on the substrate surface can be imparted with greatly increased luster and clarity along with an advantage that the substrate article is subjected to less thermal damage by virtue of the decreased temperature elevation by virtue of the limited intensity of the microwaves reaching the substrate.
Pianalto Bernard
Shin-Etsu Chemical Co. , Ltd.
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