Method for forming a structure using redeposition of etchable la

Details Method for forming a structure using redeposition of etchable la Method for forming a structure using redeposition of etchable la

1998-06-23

2000-02-22

Young, Christopher G.

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Making electrical device

430316, 430317, 430318, 438695, 438696, 438700, 438703, G03F 736

Patent

active

060278609

ABSTRACT:
A method for forming a structure by redepositing a starting material on sidewalls of a foundation during an etch of the starting material.

REFERENCES:
patent: 5185058 (1993-02-01), Cathey
patent: 5320981 (1994-06-01), Blalock
patent: 5354705 (1994-10-01), Mathews et al.
patent: 5438011 (1995-08-01), Blalock et al.
patent: 5451543 (1995-09-01), Woo et al.
patent: 5792593 (1998-08-01), McClure et al.

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