Chemistry: electrical and wave energy – Processes and products – Coating – forming or etching by sputtering
Patent
1993-07-06
1995-07-04
Nguyen, Nam
Chemistry: electrical and wave energy
Processes and products
Coating, forming or etching by sputtering
20419215, 20419223, C23C 1434
Patent
active
054297311
ABSTRACT:
The present invention relates to a method for forming a layer of isotropic soft magnetic nitride alloy even by means of mass-production apparatus wherein a target size is large in comparison to a distance between a substrate and a target, by using a bias sputtering method wherein a negative bias voltage is continuously applied to a substrate and sputtering is carried out in Ar atmosphere mixed with nitrogen gas or periodically mixed with nitrogen gas. Furthermore, the present invention may include a heat treatment of the soft magnetic nitride alloy layer deposited on the substrate in a temperature of more than 300.degree..degree.C. to less than 800.degree. C. to improve a soft magnetic characteristic.
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Ihara Keita
Nago Kumio
Ohnishi Youichi
Osano Koichi
Sakakima Hiroshi
Matsushita Electric - Industrial Co., Ltd.
Nguyen Nam
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