Semiconductor device manufacturing: process – Coating with electrically or thermally conductive material – Insulated gate formation
Reexamination Certificate
2006-09-12
2006-09-12
Booth, Richard A. (Department: 2812)
Semiconductor device manufacturing: process
Coating with electrically or thermally conductive material
Insulated gate formation
C438S305000
Reexamination Certificate
active
07105430
ABSTRACT:
A method for forming a semiconductor device (10) includes providing a substrate (20) having a surface; forming an insulating layer (22) over the surface of the substrate (20); forming a first patterned conductive layer (30) over the-insulating layer (22); forming a second patterned conductive layer (32) over the first patterned conductive layer (30); forming a patterned non-insulating layer (34) over the second patterned conductive layer (32); and selectively removing portions of the first and second patterned conductive layers (30, 32) to form a notched control electrode for the semiconductor device (10).
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Burnett James D.
Orlowski Marius K.
Booth Richard A.
Freescale Semiconductor Inc.
Hill Daniel D.
Vo Kim Marie
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