Adhesive bonding and miscellaneous chemical manufacture – Delaminating processes adapted for specified product – Delaminating in preparation for post processing recycling step
Patent
1992-10-27
1993-08-31
Powell, William A.
Adhesive bonding and miscellaneous chemical manufacture
Delaminating processes adapted for specified product
Delaminating in preparation for post processing recycling step
156656, 156657, 1566611, 156662, 156653, 156904, 437 52, 437228, 437233, H01L 21306, B44C 122, C03C 1500, C23F 100
Patent
active
052405583
ABSTRACT:
The surface area of a polysilicon electrode is increased by sputtering non-coalescing islands (20) of aluminum onto a silicon dioxide layer (18), which is overlying the polysilicon electrode. The sputtering process allows uniform island formation to be achieved independent of the deposition surface. The non-coalescing islands are then used as a mask, and a portion of the buffer layer (22) and a portion of the polysilicon electrode (26) are etched to form pillar-like regions (30) within the polysilicon electrode.
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Kawasaki Hisao
Kirsch Howard C.
Sharma Umesh
Clingan Jr. James L.
Jones Maurice J.
Motorola Inc.
Powell William A.
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