Method for forming a reflection-type light diffuser

Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Making named article

Reexamination Certificate

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C430S026000, C430S320000, C430S322000, C430S324000, C430S330000

Reexamination Certificate

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06986983

ABSTRACT:
A reflection-type light diffuser is fabricated on a glass substrate, which has a pixel matrix array disposed thereon. The pixel matrix array includes a plurality of adjacent pixel regions, and each of the pixel regions has a pair of side edges that are parallel and opposite. A photoresist pattern is formed on the glass substrate, and the photoresist pattern includes a plurality of wave-shaped straight protrusions formed on the side edges of each of the pixel regions and a plurality of bump structures formed on each of the pixel regions. A reflective metal layer is formed on the photoresist pattern.

REFERENCES:
patent: 5499128 (1996-03-01), Hasegawa et al.
patent: 5886119 (1999-03-01), Schaedeli et al.
patent: 5936668 (1999-08-01), Sawanobori et al.
patent: 6096634 (2000-08-01), Nguyen
patent: 6291146 (2001-09-01), Chang et al.

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