Method for forming a multi-level reticle

Details Method for forming a multi-level reticle Method for forming a multi-level reticle

1996-06-10

1999-06-22

Codd, Bernard

Radiation imagery chemistry: process, composition, or product th

Radiation modifying product or process of making

Radiation mask

216 12, G03F 900

Patent

active

059142022

ABSTRACT:
A method is providing for making a multi-level reticle which transmits a plurality of incident light intensities, which in turn, are used to form a plurality of thicknesses in a photoresist profile. A partially transmitting film, used as one of the layers of the reticle, is able to provide an intermediate intensity of phase shifted light. The intermediate intensity light has an intensity approximately midway between the intensity of the unattenuated light passing through the reticle substrate layer, and the totally attenuated light blocked by an opaque layer of the reticle. The exposed photoresist receives light at two intensities to form a via hole in the resist in response to the higher intensity light, and a connecting line to the via at an intermediate level of the photoresist in response to the intermediate light intensity. A method for forming the multi-level resist profile from the multi-level reticle is provided as well as a multi-level reticle apparatus.

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