Etching a substrate: processes – Etching of semiconductor material to produce an article...
Patent
1994-09-14
1996-08-20
Powell, William
Etching a substrate: processes
Etching of semiconductor material to produce an article...
216 38, 437233, 437235, B44C 122
Patent
active
055470939
ABSTRACT:
A method for forming a motion sensor for sensing motion or acceleration of a body, such as the type used in VCR cameras and onboard automotive and aerospace safety control system or navigational system. The motion sensor includes a sensing structure, such as a resonating metal ring and spring structure, which is supported above a substrate and circumscribed by an electrode pattern. The sensing structure is supported above the substrate by an electrically-conductive post located at the axis of motion. The electrodes serve to drive the ring into resonance, balance the sensing structure by inducing stiffness in the ring and springs, and sense rotary motion of the ring. To electrically interconnect the ring with the electrodes, three non-dielectric layers are formed on the substrate to form a radial conductor pattern, a concentric conductor pattern and a bias plane beneath the sensing structure. In accordance with this invention, one of the non-dielectric layers is a planarized doped polysilicon layer, while the remaining two non-dielectric layers are planarized and passivated metal layers. Additional accessories for enhancing the performance and reliability of the motion sensor include one or more g-stops which prevent excessive deflection, and particle getters.
REFERENCES:
patent: 5447601 (1995-09-01), Norris
Delco Electronics Corporation
Funke Jimmy L.
Powell William
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