Method for forming a magnetic pole by patterning a mask layer an

Details Method for forming a magnetic pole by patterning a mask layer an Method for forming a magnetic pole by patterning a mask layer an

1996-08-21

1999-02-16

Duda, Kathleen

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Making electrical device

430312, 430318, 430320, 430394, 216 22, 216 49, G03F 726

Patent

active

058718850

ABSTRACT:
A method for forming a lower magnetic pole in a thin film magnetic head reduces the steepness of steps thereof. The method begins with the preparation of the mask layer, including a bottom surface and a sloping wall having an angle of inclination .theta. with respect to the bottom surface on top of the magnetic layer. Thereafter, the magnetic layer is patterned into the lower magnetic pole, including a flat bottom surface and an inclined wall which has a reduced steepness in comparison to the sloping wall of the mask layer. The inclined wall is made less steep by controlling the ratio of the etching rate of the magnetic layer to that of the mask layer.

REFERENCES:
patent: 5242543 (1993-09-01), Maejima
patent: 5277835 (1994-01-01), Ohmi
patent: 5378309 (1995-01-01), Rabinzohn

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