Chemistry: electrical and wave energy – Processes and products – Vacuum arc discharge coating
Patent
1986-04-17
1988-02-16
Demers, Arthur P.
Chemistry: electrical and wave energy
Processes and products
Vacuum arc discharge coating
20419211, 20419215, 427 38, 427 39, 427 41, 428408, C23C 1400
Patent
active
047253452
ABSTRACT:
A method of forming diamond-like carbon layer which is advantageously adaptable as a coating layer on acoustic diaphragms. In the method, carbon vaporized out of solid carbon source is deposited onto the surface of the diaphragm as the coating layer in the atmosphere of catalystic gas, for instance, H.sub.2 +Ar or H.sub.2 of about 10.sup.-4 Torr. The deposited carbon layer on the surface of the diaphragm is an amorphous carbon of inclusion of hybridized orbital SP.sup.2 bond and hybridized orbital SP.sup.3 bond and crystalline carbon particles of hybridized orbital SP.sup.3 bond dispersed in the amorphous carbon, or an amorphous carbon of inclusion of hybridized orbital SP.sup.2 bond and hybridized orbital SP.sup.3 bond.
REFERENCES:
patent: 4173522 (1979-11-01), Pulker et al.
patent: 4460060 (1984-07-01), Hasumi et al.
patent: 4470479 (1984-09-01), Inoue et al.
patent: 4486286 (1984-12-01), Lewin et al.
patent: 4490229 (1984-12-01), Mirtich et al.
patent: 4525417 (1985-06-01), Dimigen et al.
patent: 4551216 (1985-11-01), Argyo
patent: 4552243 (1985-11-01), Melillo et al.
Banks et al., Jvac Sci. Technol. 21(3), 1982, pp. 807-814.
Iwakura Shiro
Ohta Shuhei
Sakamoto Masakatsu
Sato Tsugio
Toshima Hiroaki
Demers Arthur P.
Ferguson Jr. Gerald J.
Foycik, Jr. Michael J.
Hoffman Michael P.
Kabushiki Kaisha Kenwood
LandOfFree
Method for forming a hard carbon thin film on article and applic does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Method for forming a hard carbon thin film on article and applic, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method for forming a hard carbon thin film on article and applic will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-2219502