Method for forming a fine pattern in a semicondutor device

Details Method for forming a fine pattern in a semicondutor device Method for forming a fine pattern in a semicondutor device

2007-06-07

2011-11-29

Duda, Kathleen (Department: 1722)

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Making electrical device

C430S394000, C430S961000

Reexamination Certificate

active

08067146

ABSTRACT:
A method for forming a fine pattern a semiconductor device includes the steps of forming a first photoresist pattern over a semiconductor substrate having an underlying layer; coating a pattern hardening coating agent over the first photoresist pattern, thereby forming a pattern hardening film; forming a second photoresist film over the resulting structure; and selectively exposing and developing the second photoresist film, thereby forming a second photoresist pattern to be defined between neighboring first photoresist pattern.

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