Coating processes – Direct application of electrical – magnetic – wave – or... – Plasma
Patent
1996-10-10
1998-07-07
King, Roy V.
Coating processes
Direct application of electrical, magnetic, wave, or...
Plasma
427572, 427573, 427574, 427578, 427596, B05D 306
Patent
active
057765570
ABSTRACT:
A thin film forming method which comprises the steps of supporting a substrate to be treated, having a trench or an unevenness thereon, in a reaction vessel; introducing a reactive gas into the reaction vessel; activating the reactive gas to form a deposit species, the deposit species characterized by a phase diagram including a liquid phase region defined by a melting curve and an evaporation curve that intersect at a triple point; and forming a thin film containing at least a part of the deposit species on the substrate while retaining a pressure of the deposit species in the reaction vessel higher than the triple point of the phase diagram of the deposit species, and retaining a temperature of the substrate within the liquid phase region of the phase diagram of the deposit species.
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Noguchi Sadahisa
Okano Haruo
Sekine Makoto
Kabushiki Kaisha Toshiba
King Roy V.
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