Method for forming a film

Details Method for forming a film Method for forming a film

1999-03-05

2000-08-29

King, Roy V.

Coating processes

Direct application of electrical, magnetic, wave, or...

Plasma

4272497, 427571, 427572, 427575, 427902, 427904, 427576, 427578, 427122, 4272498, H05H 124, H05H 102

Patent

active

061105422

ABSTRACT:
A method for forming a film by a plasma CVD process in which a high density plasma is generated in the presence of a magnetic field is described, characterized by that the electric power for generating the plasma has a pulsed waveform. The electric power typically is supplied by microwave, and the pulsed wave may be a complex wave having a two-step peak, or may be a complex wave obtained by complexing a pulsed wave with a stationary continuous wave of an electromagnetic wave having the same or different wavelength as that of the pulsed wave. The process enables deposition of a uniform film having an excellent adhesion to the substrate, at a reduced power consumption.

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