Method for forming a circuit pattern

Details Method for forming a circuit pattern Method for forming a circuit pattern

1994-05-27

1996-04-02

Duda, Kathleen

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Making electrical device

430966, 430967, 378 34, 378156, 378157, 378161, G03F 720

Patent

active

055039588

ABSTRACT:
In one embodiment of the invention x-rays pass through an aluminum filter (18) to form filtered x-rays. At least a portion of the filtered x-rays then pass through a portion of a x-ray mask (22) to expose a portion of a photoresist layer overlying a semiconductor substrate. The aluminum filter removes high energy photons from the x-ray spectrum that adversely effect the lithographic patterning process.

REFERENCES:
patent: 4528685 (1985-07-01), Kump
patent: 5142561 (1992-08-01), Doumas
Scott D. Hector et al., "Simultaneous optimization of spectrum, spatial coherence, gap, feature bias, and absorber thickness in synchrotron-based proximity x-ray lithography", Nov./Dec. 1993, Journal of Vacuum Science and Technology B, 11 (6), pp. 2981-2985.
Microlithography Process Technology for IC Fabrication, by David J. Elliot, published by McGraw-Hill Book Company, 1986, pp. 193-211.

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