Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Making electrical device
Patent
1996-05-30
1999-04-27
Nuzzolillo, Maria
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Making electrical device
430313, G03C 500
Patent
active
058979832
ABSTRACT:
In a method for forming an annular-shaped and vertically extending bottom electrode of a memory cell capacitor, a conductive film is formed on an inter-layer insulator. A photo-resist material is applied on the conductive film to form a photo-resist film thereon. The photo-resist film is patterned by a photo-lithography using a mask which includes a transparent plate-like body and a phase shifting film selectively provided on a predetermined region of the transparent plate-like body to form an annular-shaped and vertically extending photo-resist pattern over the conductive film. The conductive film is subjected to an anisotropic etching, in which the annular-shaped and vertically extending photo-resist pattern is used as a mask, to form an annular-shaped and vertically extending bottom electrode under the annular-shaped and vertically extending photo-resist pattern. The annular-shaped and vertically extending photo-resist pattern is removed.
REFERENCES:
patent: 4714668 (1987-12-01), Uneno et al.
patent: 5132240 (1992-07-01), Shimomura et al.
patent: 5620918 (1997-04-01), Kondoh
Hirota Toshiyuki
Kurokawa Tomomi
Yokota Kazuki
Zenke Masanobu
NEC Corporation
Nuzzolillo Maria
Weiner Laura
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