Method for focusing electron beam in electron column

Details Method for focusing electron beam in electron column Method for focusing electron beam in electron column

2011-03-08

2011-03-08

Berman, Jack I (Department: 2881)

Radiant energy

With charged particle beam deflection or focussing

Magnetic lens

C250S310000, C250S398000, C250S492200

Reexamination Certificate

active

07902521

ABSTRACT:
The present invention relates to a method for improving focusing in an electron column that generates an electron beam. The method for controlling the focusing of an electron beam in according to the present invention reduces the spot size of the electron beam when the electron beam reaches a specimen, so that resolution can be increased and the line width of a pattern in a semiconductor lithography process can be reduced, with the result that the performance of the electron can be improved.

REFERENCES:
patent: 5122663 (1992-06-01), Chang et al.
patent: 5138169 (1992-08-01), Yamazaki et al.
patent: 5557105 (1996-09-01), Honjo et al.
patent: 6909103 (2005-06-01), Platzgummer et al.
patent: 7465922 (2008-12-01), McCord
patent: 2005/0199820 (2005-09-01), Eastham
patent: 2010/0187433 (2010-07-01), Eastham

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