Method for fixing functional material and patterned functional m

Details Method for fixing functional material and patterned functional m Method for fixing functional material and patterned functional m

1997-03-10

2000-05-23

Chu, John S.

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Including heating

430165, 430191, 430192, 430325, 430326, A03F 730, G03F 7023

Patent

active

06066438&

ABSTRACT:
A method for fixing, on a substrate, functional material such as proteins, enzymes, polysaccharides, nucleic acids, microorganisms, viruses and cultured cells, includes the steps of (i) forming on the substrate a photosensitive layer containing DNQ, novolak, and optionally imidazole; (ii) applying onto the substrate functional material containing at least one amino group; (iii) before or after step (ii), irradiating in a pattern the photosensitive layer with light of appropriate wavelength(s) to convert DNQ to a ketene compound; and (iv) reacting the amino group with the ketene compound to fix via amido bonding the functional material to the substrate via the photosensitive layer along the pattern.

REFERENCES:
patent: 5134057 (1992-07-01), Kuypers et al.
H. Morgan, et al., Photo-patterning of sensor surfaces with biomolecular structures: characterisation using AFM and fluorescence microscopy, Biosensors & Bioelectronics 10 (1995) 841-846.
Steven A. Sundberg, et al., Spatially-Addressable Immobilization of Macromolecules on Solid Supports, J. Am. Chem. Soc. 1995, 117, 12050-12057 .

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