Method for fast and non-destructive examination of etched featur

Details Method for fast and non-destructive examination of etched featur Method for fast and non-destructive examination of etched featur

1994-02-04

1995-10-17

Powell, William

Etching a substrate: processes

Gas phase etching of substrate

With measuring, testing, or inspecting

216 84, 216 41, B44C 122

Patent

active

054587310

ABSTRACT:
Methods for examining a structure etched in a material layer are disclosed. An inspection aperture next to the structure is formed without appreciably disturbing the etching of the structure. The inspection aperture is formed such that it merges with a portion of the structure's perimeter wall to create an inspection window through which the structure may be readily observed. The observed image of the perimeter wall and bottom of the structure is comparable to that obtained by cleaving, and is achieved without destroying the wafer or substrate on which the etched structure is formed. An etch mark designed to implement the method is also disclosed.

REFERENCES:
patent: 4393311 (1983-07-01), Feldman et al.
patent: 4496425 (1985-01-01), Kuyel
patent: 4503329 (1985-03-01), Yamaguchi et al.
patent: 4512847 (1985-04-01), Brunsch et al.
patent: 4650744 (1987-03-01), Amano
patent: 4725332 (1988-02-01), Spohr
patent: 4725730 (1988-02-01), Kato et al.
patent: 4733074 (1988-03-01), Kato et al.
patent: 4767495 (1988-08-01), Nishioka
patent: 4788117 (1988-11-01), Cuthbert et al.
patent: 4863548 (1989-09-01), Lee
patent: 4958074 (1990-09-01), Wolf et al.
patent: 5023453 (1991-06-01), Adachi et al.
patent: 5086230 (1992-02-01), Adachi et al.
patent: 5111043 (1992-05-01), Shigenaka et al.
patent: 5113072 (1992-05-01), Yamaguchi et al.
patent: 5332464 (1994-07-01), Namose

Affiliated with

Also associated with

Rating

Method for fast and non-destructive examination of etched featur does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Method for fast and non-destructive examination of etched featur, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method for fast and non-destructive examination of etched featur will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-593971