Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Making electrical device
Patent
1996-09-18
1998-11-10
Duda, Kathleen
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Making electrical device
430318, 438262, G03F 700
Patent
active
058341617
ABSTRACT:
A method for fabricating word lines of a semiconductor device, advantageous in that the word lines are easy to form, the process allowance for the neighboring patterns is sufficiently secured and thereby enhances the process yield and reliability of device operation. In an asymmetric memory unit cell structure having a T- or Z-shaped active region, the distortion of the word lines, attributable to the diffused reflection occurring at the boundary of an element isolation oxide film, is compensated by shifting the opposite word lines up and/or down a distance as long as the distortion is caused by the diffused reflection at the slant part of an active region. As a result, the center of the word line coincides with that of contact.
REFERENCES:
patent: 5065215 (1991-11-01), Kubota
patent: 5464999 (1995-11-01), Bergemont
patent: 5566106 (1996-10-01), Bergemont
Duda Kathleen
Hyundai Electronics Industries Co,. Ltd.
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