Method for fabricating thin film transistor substrate

Details Method for fabricating thin film transistor substrate Method for fabricating thin film transistor substrate

2006-12-04

2009-06-23

Nguyen, Ha Tran T (Department: 2829)

Semiconductor device manufacturing: process

Making field effect device having pair of active regions...

On insulating substrate or layer

C438S030000, C438S151000, C257S059000, C349S042000

Reexamination Certificate

active

07550327

ABSTRACT:
This invention provides method for fabricating a thin film transistor substrate that is adaptive for forming a good pattern design and also removing a stepped difference using a three-mask process.

REFERENCES:
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patent: 2004/0125327 (2004-07-01), Choi et al.
patent: 2004/0129943 (2004-07-01), Yoo et al.
patent: 2004/0197966 (2004-10-01), Cho et al.
patent: 2004/0232421 (2004-11-01), Ono et al.
patent: 2005/0095759 (2005-05-01), Cho et al.
patent: 2005/0130353 (2005-06-01), Yoo et al.
patent: 2006/0145161 (2006-07-01), Lee et al.
patent: 2007/0164289 (2007-07-01), Jung

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