Semiconductor device manufacturing: process – Chemical etching – Combined with coating step
Reexamination Certificate
2004-05-27
2008-08-12
Baumeister, Bradley W. (Department: 2891)
Semiconductor device manufacturing: process
Chemical etching
Combined with coating step
C438S702000, C427S466000, C257SE21535, C347S107000
Reexamination Certificate
active
07410905
ABSTRACT:
A method for fabricating a thin film pattern on a substrate, includes the steps of: forming a concave part on the substrate that conforms to the thin film pattern; and applying a function liquid into the concave part.
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Hasei Hironori
Hirai Toshimitsu
Kiguchi Hiroshi
Mikoshiba Toshiaki
Ushiyama Toshihiro
Baumeister Bradley W.
Oliff & Berridg,e PLC
Seiko Epson Corporation
Such Matthew W
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