Method for fabricating thin film pattern, device and...

Semiconductor device manufacturing: process – Chemical etching – Combined with coating step

Reexamination Certificate

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C438S702000, C427S466000, C257SE21535, C347S107000

Reexamination Certificate

active

07410905

ABSTRACT:
A method for fabricating a thin film pattern on a substrate, includes the steps of: forming a concave part on the substrate that conforms to the thin film pattern; and applying a function liquid into the concave part.

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