Method for fabricating reflective-type LCD

Details Method for fabricating reflective-type LCD Method for fabricating reflective-type LCD

2005-08-09

2005-08-09

McPherson, John A. (Department: 1756)

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Making named article

C430S330000

Reexamination Certificate

active

06927017

ABSTRACT:
Disclosed is a method for fabricating a reflective-type liquid crystal display device, capable of uniformly forming embossings causing a uniform reflective angle of incident light over the whole area of a substrate. The method includes the steps of coating a negative type organic insulation layer, soft-baking the organic insulation layer, performing a primary exposure process for the organic insulation layer, performing a secondary exposure process by using an exposure mask having openings, and curing the organic insulation layer through a post bake process and performing a thermal process with respect to a non-exposed part of the organic insulation layer, thereby forming embossings. The primary exposure process is carried out by applying an energy less than an optimum energy, and the secondary exposure process is carried out by applying the optimum energy.

REFERENCES:
patent: 2004/0001174 (2004-01-01), Doi et al.
patent: 11-248909 (1999-09-01), None
patent: 2002-350841 (2002-12-01), None
patent: 2004-037520 (2005-02-01), None

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