Method for fabricating polymer ridged waveguides by using...

Details Method for fabricating polymer ridged waveguides by using... Method for fabricating polymer ridged waveguides by using...

2007-12-12

2009-12-22

McPherson, John A. (Department: 1795)

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Making named article

C430S394000

Reexamination Certificate

active

07635555

ABSTRACT:
This invention is a method for fabricating polymer ridged waveguides by using tilted immersion lithography. It includes the steps of: 1. preparing step; 2. calculating step; 3. first tilted immersion lithography step; 4. rotating 180-degree step; 5. second tilted immersion lithography step; and 6. finishing step. By these two tilted immersion lithography steps as well as the rotating 180-degree step between them, the UV light refracts and makes the photoresist forming a 45-degree ridged waveguide. This fabricating method is simple and stable. It can reduce the fabricating time and cost. Also, it is suitable for mass production and it has wide-ranged applications.

REFERENCES:
patent: 2004-133300 (2004-04-01), None
Computer-generated translation of JP 2004-133300 (Apr. 2004).
IBM Technical Disclosure Bulletin, vol. 35, Issue 5, pp. 460-462 (Oct. 1992).
IBM Technical Disclosure Bulletin, vol. 32, Issue 11, pp. 305-307 (Apr. 1990).

Affiliated with

Also associated with

Rating

Method for fabricating polymer ridged waveguides by using... does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Method for fabricating polymer ridged waveguides by using..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method for fabricating polymer ridged waveguides by using... will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-4138995